OKAMOTO晶圆减薄GNX200BP研磨机概要
GNX200BP Wafer Grinding is a fully automatic continuous downfeed grinding machine. Wafers are handled through the machine by a robot, and load/unload arms. Two different stations are used for wafer cleaning after the final grind station. Chuck speed, grinding wheel, and grind spindle downfeed rate speeds can be used to manipulate grinder throughput, surface finish, and wheel life. A two-point in-process gauge measuring system controls wafer thickness under grind spindles 1 and 2. A three-point grind spindle angle adjustment mechanism is utilized for easily maintaining wafer profile (ttv); with the option a motorized adjustment. After completion at the grind station, the wafer transfers to Polish unit automatically. The local polishing unit removes subsurface damage for increased wafer die strength, and the ability to handle final thickness of 50 microns.
GNX200BP晶圆研磨机是一款全自动的连续向下进给研磨机。晶圆由机械手通过机器进行处理，并装载/卸载臂。在最终研磨站之后，使用两个不同的站进行晶片清洁。卡盘转速，砂轮转速和砂轮主轴下降速度可以用来控制砂轮的产量，表面光洁度和砂轮寿命。两点制程量规测量系统控制磨削主轴1和2下的晶片厚度。三点磨削主轴角度调节机构用于轻松保持晶片轮廓（ttv）；可选配电动调节装置。在研磨站完成后，晶片将自动转移到抛光单元。局部抛光单元消除了表面下的损坏，从而提高了晶片的芯片强度，并具有处理50微米最终厚度的能力。
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OKAMOTO晶圆减薄GNX200BP研磨机相关产品：
衡鹏供应
OKAMOTO GDM300晶圆研磨/晶圆减薄/晶圆抛光/晶圆背抛/Wafer Grinding
